Multilayered Low Temperature Cofired Ceramics Ltcc Technology

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Format: Hardcover
Pub. Date: 2004-12-30
Publisher(s): Springer Verlag
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Summary

"LTCC is a technology where multilayered ceramic, fireable at low temperatures of around 1,000[degrees]C, is cofired with high conductive metal with a low melting point. This is the world's first book describing the materials and manufacturing processes of LTCC in detail. Written from the industrial point of view, it covers the fundamental concepts of LTCC, all of the LTCC materials (low k ceramic insulator, high k ceramic dielectric, resistor and conductor materials), as well as each of the LTCC manufacturing processes (ceramic powder preparation and mixing, green sheet casting, printing, laminating and cofiring). It also discusses the reliability of LTCCs, as well as the future prospects for LTCC and related ceramic components and circuit boards." "It is a valuable reference text and an excellent resource for graduate and post-graduate students in material science and engineering, as well as for industrial manufacturing, design, and ceramic engineers."--BOOK JACKET.

Table of Contents

Dedication v
List of Figures
xi
List of Tables
xxv
Preface xxix
Acknowledgments xxxi
Introduction
1(18)
Brief historical review
2(2)
Typical material
4(1)
Typical manufacturing process
4(1)
Typical product types
5(1)
Characteristics of LTCC
6(5)
High frequency characteristics
6(3)
Thermal stability (low thermal expansion, good thermal resistance)
9(1)
Integration of passive components
10(1)
Trends in materials developed by relevant companies
11(1)
Subject of the book
12(7)
References
16(3)
Part 1 Material technology
19(82)
Ceramic material
21(38)
Introduction
21(2)
Low temperature firing
23(13)
Fluidity of glass
24(2)
Crystallization of glass
26(7)
Foaming of glass
33(3)
Reaction between glass and ceramic
36(1)
Dielectric characteristics
36(6)
Dielectric constant
36(5)
Dielectric loss
41(1)
Thermal expansion
42(3)
Mechanical strength
45(9)
Strengthening the glass phase
47(4)
Thermal shock resistance
51(3)
Thermal conductivity
54(5)
References
55(4)
Conducting material
59(24)
Introduction
59(2)
Conductive paste materials
61(1)
Metallization methods for alumina ceramics
62(4)
Thick film metallization
62(1)
High temperature process type (Mo-Mn method)
62(1)
Low temperature process type
63(1)
Cofiring metallization
64(2)
Metallization for HTCC
66(1)
Conductivity
66(2)
Suitability for co-sintering
68(4)
Adherence
72(2)
Migration resistance
74(4)
Bondability (solder wetability and wire bondability)
78(5)
References
79(4)
Resistor materials and high K dielectric materials
83(18)
Introduction
83(1)
Resistor materials
84(8)
Ruthenium oxide/glass material
87(2)
The thermal stability of ruthenium oxide
89(3)
High K dielectric material
92(9)
Issues with low oxygen partial pressure atmosphere firing (point defects and semiconductor formation)
93(5)
References
98(3)
Part 2 Process technology
101(116)
Powder preparation and mixing
103(12)
Introduction
103(1)
Inorganic ceramic materials
104(1)
Organic materials
105(10)
Binder
106(2)
Plasticizer
108(2)
Dispersing agent and dispersibility of slurry
110(4)
References
114(1)
Casting
115(30)
Introduction
115(1)
Casting equipment
115(2)
Slurry characteristics
117(3)
Green sheet
120(22)
Characteristics required of green sheets
120(1)
Green sheet evaluation methods
121(5)
Various factors affecting the characteristics of green sheets
126(10)
Green sheet microstructure
136(4)
Green sheet dimensional stability
140(2)
Via hole punching
142(3)
References
143(2)
Printing and laminating
145(22)
Printing
145(7)
Screen printing screen specifications
147(1)
Printing process conditions
147(2)
Paste characteristics
149(3)
Green sheet characteristics
152(1)
Via filling
152(2)
Laminating
154(13)
Laminating process technologies
154(3)
Faults arising in the laminating process
157(5)
Preventing delamination
162(3)
References
165(2)
Cofiring
167(26)
Sintering the copper
169(1)
Controlling firing shrinkage
169(5)
Mismatches of firing behavior and firing shrinkage rate
174(6)
Achieving both antioxidation of the copper and elimination of binder
180(9)
Non-shrinkage process
189(1)
Cofiring process and future LTCCs
190(3)
References
191(2)
Reliability
193(10)
Thermal shock of LTCCs
195(1)
Thermal expansion and residual stress of LTCCs
196(4)
Thermal conductivity of LTCCs
200(3)
References
201(2)
Future of LTCCs
203(14)
Introduction
204(1)
Technology development of LTCCs for the future
204(6)
Materials technology development
208(2)
Process technologies
210(1)
Background of post-LTCC technology
210(7)
AD process as a post-LTCC technology
Current and future state of development of AD ceramic film
217(1)
Acknowledgement 217(2)
References
Index 219

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