
Operation and Modeling of the Mos Transistor
by Tsividis, Yannis-
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Summary
Table of Contents
Semiconductors, Junctions, and Mosfet Overview | |
Introduction | |
Semiconductors | |
Conduction | |
Transit Time | |
Drift | |
Diffusion | |
Contact Potentials | |
The pn Junction | |
Overview of the MOS Transistor | |
Basic Structure | |
A Qualitative Description of MOS Transistor Operations | |
A Fluid Dynamical Analog | |
MOS Transistor Characteristics | |
A Brief Overview of this Book | |
The Two-Terminal MOS Structure | |
Introduction | |
The Flat-Band Voltage | |
Potential Balance and Charge Balance | |
Effect of Gate-Substance Voltage on Surface Condition | |
Flat-Band Condition | |
Accumulation | |
Depletion and Inversion | |
General Analysis | |
Inversion | |
General Relations and Regions of Inversion | |
Strong Inversion | |
Weak Inversion | |
Moderate Inversion | |
Small-Signal Capacitance | |
Summary of Properties of the Regions of Inversion | |
The Three-Terminal MOS Structure | |
Introduction | |
Contacting the Inversion Layer | |
The Body Effect | |
Regions of Inversion | |
Approximate Limits | |
Strong Inversion | |
Weak Inversion | |
Moderate Inversion | |
A "VCB Control" Point of View | |
Fundamentals | |
"Pinchoff" Voltage | |
Expressions in Terms of the "Pinchoff" Voltage | |
The Four-Terminal MOS Transistor | |
Introduction | |
Transistor Regions of Operation | |
General Charge Sheet Models | |
Approximate Limits | |
Simplified Charge Sheet Models | |
Model Based on Quasi-Fermi Potentials | |
Reasons of Inversion in Terms of Terminal Voltages | |
Strong Inversion | |
Complete Symmetric Strong-Inversion Model | |
Simplified Symmetric Strong-Inversion Model | |
Simplified, Source-Referenced, Strong-Inversion Model | |
Model Origin Summary | |
Weak Inversion | |
Moderate Inversion | |
Interpolation Models | |
Source-Referenced vs. Body-Referenced Modeling | |
Effective Mobility | |
Temperature Effects | |
Breakdown | |
The p-Channel MOS Transistor | |
Enhancement-Mode and Depletion-Mode Transistors | |
Model Parameter Values, Model Accuracy, and Model Comparison References | |
MOS Transistors and Ion-Implanted Channels | |
Introduction | |
Enhancement nMOS Transistors | |
Preliminaries | |
Charges and Threshold Voltages | |
Drain-to-Source Current Model for Strong Inversion | |
Simplified Model for Strong Inversion | |
Weak Inversion | |
Depletion nMOS Transistors | |
The Need for an n-Type Implant | |
Charges and Threshold Voltage | |
Transistor Operation5.4. Enhancement pMOS Transistors | |
Surface-Channel Enhancement-Mode pMOS | |
Buried-Channel Enhancement-Mode pMOS | |
Small-Dimension Effectsby D. Antoniadas, Massachuseets Institute of Technology | |
Introduction | |
Channel Length Modulation | |
Barrier Lowering, Two-Dimensional Charge Sharing, and Threshold Voltage | |
Introduction | |
Short-Channel Devices | |
Narrow-Channel Devices | |
Summary and Comments | |
Punchthrough | |
Carrier Velocity Syndrome | |
Hot Carrier Effects-Substrate Current, Gate Current, and Breakdown | |
Scaling | |
Effect of Surface and Drain Series Resistances | |
Effects Due to Thin Oxides and High Doping | |
The MOS Transistor in Dynamic Operation-Large-Signal Modeling | |
Introduction | |
Quasi-Static Operation | |
Terminal Currents in Quasi-Static Operation | |
Evaluation of Charges in Quasi-Static Operation | |
Introduction | |
Strong Inversion | |
Moderate Inversion | |
Weak Inversion | |
General Charge Sheet Model | |
Depletion | |
Accumulation | |
Plots of Charges versus VGS | |
Uses of Charges in Evaluating Terminal Currents | |
Transit Time Under DC Conditions | |
Limitations of the Quasi-Static Model | |
Non-Quasi-Static Modeling | |
Introduction | |
The Continuity Equation | |
Non-Quasi-Static Analysis | |
Small-Signal Modeling for Low and Medium Frequencies | |
Introduction | |
A Low-Frequency Small-Signal Model for the Intrinsic Part | |
A Two-Path View | |
Table of Contents provided by Publisher. All Rights Reserved. |
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